POROUS SILICON UNIT µPorSi
The porous silicon formation system µPorSi is a sufficient wet chemical solution for porous silicon formation and electropolishing of silicon. Together with our Power Supply PS2, MOT offers an all-in-one solution for this range of fabrication methods. As an option, an optical windows allows for light-assisted porous silicon formation. Because of the flexible arrangement and build-up, the porous silicon formation system μPorSi is the ideal tool either for industrial or R&D demands. Of course, customized solutions are available after clearing the technical details.
POROUS SILICON UNIT µPorSi
Data sheet
Wafer Sizes: up to 300mm
Applications: MEMS, CMOS, Sensor, PV, R&D or Production Type,
ETCHING MODULES
· Overflow circulation with filtration
· Customized Chamber amount selection
· PLC controlled
· Touch Panel for easy operation
RINSING MODULE
· Standard: Overflow Rinse,
· Optional: QDR, Pentane, IPA
BUILD-UP
· Material: PP white,
· Door material: PVC transparent,
· PP plumbing, optional PVDF or PFA tube with
PFA Flaretek Fittings
· Access Panel: Touch Panel
OPERATING ELEMENTS
· All process operating elements are integrated into the front panel,
· All electrical and pneumatically components are integrated in an independent compartment in the back side service area,
· DIW- and N2-Spray gun integrated in the working surface
General OPTIONS
· Automatic Handling (Ready for Robot Handling)
· Light assisted porous silicon formation
· fully metal-ion free wafer processing possible
· Internal Chemical Management
· Integration of pre/post process cells, Laminar- Flow- Units
· Execution as fume hood
· FM 4910 proofed material
For further questions or demands, please feel free to contact us under www.mot-semicon.com or contact@m-o-t.info
M-O-T, Mikro und Oberflaechentechnik GmbH, Krughuetterstrasse 93, D-66128 Saarbruecken, Germany
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